ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,707,712, issued on Aug. 11, was assigned to Intel Corp. (Santa Clara, Calif.).
"Amorphized subfins using backside implantation" was invented by Adam Neale (Portand, Ore.), Soonyoung Lee (Portland, Ore.), Md Masud Parvez Arnob (North Plains, Ore.), Norbert Seifert (Beaverton, Ore.), Jeffrey Hicks (Banks, Ore.), Aurelia Chi Wang (Hillsboro, Ore.), Giorgio Mariottini (Hillsboro, Ore.), Jaladhi Mehta (Beaverton, Ore.), Conor P. Puls (Portland, Ore.) and Anant H. Jahagirdar (Portland, Ore.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Techniques to form semiconductor devices that include subfins that are at least partially amorphized are described. A backsi...