US Patent Issued to Intel NDTM US on Nov. 3 for "Method for pillar bending improvement by cut tiers pattern implementation" (Chinese, American Inventors)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,787,272, issued on Nov. 3, was assigned to Intel NDTM US LLC (Santa Clara, Calif.).

"Method for pillar bending improvement by cut tiers pattern implementation" was invented by Jong Sun Sel (Dalian, China), Yao Xing (Dalian, China), Long Chen (Dalian, China), Hoon Koh (San Jose, Calif.), Wenwu Zhu (Dalian, China) and Anil Chandolu (Boise, Idaho).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods and apparatus for pillar bending improvement by cut tiers pattern implementation. The method uses a cut tier pattern in a staircase region of a 3D memory structure to reduce pillar bending in a pillar array region. The pillar array region includes a plurality o...