US Patent Issued to INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE on Aug. 11 for "Correction system and correction method for ill-exposed images" (Taiwanese Inventor)

ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,707,155, issued on Aug. 11, was assigned to INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (Hsinchu, Taiwan).

"Correction system and correction method for ill-exposed images" was invented by Te-Mei Wang (Hsinchu City, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A correction method for ill-exposed (IE) images, comprises the following steps. (1) A series of original images are captured. (2) The original images are classified as a set of first well-exposed (WE) images and IE images by utilizing a first computational model, according to a lightness distribution of each of the original images. The IE images have a plurality of exposure types including a ...