US Patent Issued to IMS Nanofabrication on July 28 for "Optimizing image distortion in a multi beam charged particle processing apparatus" (Austrian Inventors)

ALEXANDRIA, Va., July 28 -- United States Patent no. 12,695,055, issued on July 28, was assigned to IMS Nanofabrication GmbH (Brunn am Gebirge, Austria).

"Optimizing image distortion in a multi beam charged particle processing apparatus" was invented by Christoph Spengler (Vienna) and Michael Haberler (Vienna).

According to the abstract* released by the U.S. Patent & Trademark Office: "The invention proposes adjusting the optical imaging system of a charged-particle multi-beam processing apparatus with regard to spatial and angular image distortion of the beam field, which describes the deviation of landing positions and landing angles of beamlets from respective nominal values within the beam field. Starting from a determination of the i...