US Patent Issued to Illumina on March 3 for "Sequencer focus quality metrics and focus tracking for periodically patterned surfaces" (California Inventors)

ALEXANDRIA, Va., March 3 -- United States Patent no. 12,566,125, issued on March 3, was assigned to Illumina Inc. (San Diego).

"Sequencer focus quality metrics and focus tracking for periodically patterned surfaces" was invented by Thomas Baker (San Diego), Kevin Early (San Diego), Siqi Zhang (San Diego), Rachel Abaskharon (San Diego), Anmiv Prabhu (San Diego) and Patrick Wen (Encinitas, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Generation and use of a focus quality metric that is intensity independent is described. In one example, the focus quality metric is generated by acquiring an image, such as an image of a patterned surface of a flow cell, and processing all or part (e.g., a sub-region or ...