US Patent Issued to I-PEX PIEZO SOLUTIONS on July 21 for "Film structure and method for producing the same" (Japanese Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,393, issued on July 21, was assigned to I-PEX PIEZO SOLUTIONS INC. (Yamaguchi, Japan).

"Film structure and method for producing the same" was invented by Akio Konishi (Yamaguchi, Japan) and Hiroaki Kanamori (Yamaguchi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A film structure comprises a substrate and a buffer film formed on the substrate. The substrate is a 36deg to 48deg rotated Y-cut Si substrate, or the substrate is a SOI substrate comprising a base substance made of the 36deg to 48deg rotated Y-cut Si substrate, an insulating layer on the base substance, and a SOI layer made of a Si film on the insulating layer, and a Miller index o...