US Patent Issued to HyperLight on March 3 for "Thin film lithium-containing photonics wafer having a trap-rich substrate" (Massachusetts Inventors)

ALEXANDRIA, Va., March 3 -- United States Patent no. 12,566,343, issued on March 3, was assigned to HyperLight Corp. (Cambridge, Mass.).

"Thin film lithium-containing photonics wafer having a trap-rich substrate" was invented by Fan Ye (Lincoln, Mass.), Christian Reimer (Wellesley, Mass.), Mian Zhang (Cambridge, Mass.), Kevin Luke (Cambridge, Mass.) and Amirmahdi Honardoost (Somerville, Mass.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate configured for an electro-optic device and an electro-optic device formed using the substrate are described. The substrate includes a semiconductor substrate, an insulating layer, and at least one thin film optical material. The semiconductor substrate includes ...