US Patent Issued to Huizhou Youdian Technology on Aug. 25 for "Face mask" (Chinese Inventor)

ALEXANDRIA, Va., Aug. 25 -- United States Patent no. D1,145,165, issued on Aug. 25, was assigned to Huizhou Youdian Technology Co. Ltd. (Huizhou, China).

"Face mask" was invented by Jiajin Zeng (Huizhou, China).

The patent was filed on Sept. 10, 2025, under Application No. D/022,366.

*For further information, including images, charts and tables, please visit: http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=1&f=G&l=50&co1=AND&d=PTXT&s1=D1145165&OS=D1145165&RS=D1145165

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