ALEXANDRIA, Va., April 21 -- United States Patent no. 12,607,934, issued on April 21, was assigned to Huawei Technologies Co. LTD. (Shenzhen, China).
"Patterning material and patterned film" was invented by Yu Zhang (Shenzhen, China), Zhixiong Zeng (Shenzhen, China) and Huihui Zhou (Shenzhen, China).
According to the abstract* released by the U.S. Patent & Trademark Office: "Example patterning materials and pattern films are described. One example patterning material includes polysiloxane. The polysiloxane includes at least one cyclic structure formed by silicon-oxygen (Si-O) bond repetitions and an organic group connected to a Si atom in the at least one cyclic structure. A subset of Si atoms in the at least one cyclic structure are subs...