ALEXANDRIA, Va., May 19 -- United States Patent no. 12,635,151, issued on May 19, was assigned to Hua Hong Semiconductor (WUXI) Ltd. (Wuxi, China).
"Digital isolator structure and method for forming the same" was invented by Hongfeng Jin (Wuxi, China), Hongxu Yang (Wuxi, China) and Hualun Chen (Wuxi, China).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure provides a digital isolator structure and a method for forming the same. The method includes: providing a substrate; forming a first electrode plate on a surface of the substrate and forming a dielectric layer on the first electrode plate; etching the dielectric layer until the first electrode plate is exposed to form a deep trench in th...