US Patent Issued to HOYA on Aug. 4 for "Multilayered-reflective-film-provided substrate, reflective mask blank, reflective mask, method of manufacturing reflective mask, and method of manufacturing semiconductor device" (Japanese Inventors)

ALEXANDRIA, Va., Aug. 5 -- United States Patent no. 12,699,314, issued on Aug. 4, was assigned to HOYA Corp. (Tokyo).

"Multilayered-reflective-film-provided substrate, reflective mask blank, reflective mask, method of manufacturing reflective mask, and method of manufacturing semiconductor device" was invented by Kota Suzuki (Tokyo) and Takahiro Onoue (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A multilayered-reflective-film-provided substrate includes: a substrate; a multilayered reflective film provided on the substrate; and a protective film provided on the multilayered reflective film, in which the protective film includes ruthenium (Ru) and at least one additive material selected from aluminum...