US Patent Issued to HONOR DEVICE on Oct. 27 for "Ray tracing rendering based on ray emission density" (Chinese Inventor)

ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,776,094, issued on Oct. 27, was assigned to HONOR DEVICE Co. LTD. (Shenzhen, China).

"Ray tracing rendering based on ray emission density" was invented by Zhichao Liu (Shenzhen, China).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of this application relate to the field of electronic technologies. Provided are a rendering method and apparatus, a device, and a storage medium. In a graphics rendering process, for a to-be-rendered model included in to-be-rendered data, when the to-be-rendered model meets a first condition, ray tracing rendering is performed on the to-be-rendered model based on first ray emission density; or when the to-be-rende...