ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,702,872, issued on Aug. 11, was assigned to Honeywell Safety Products USA Inc. (Latham, N.Y.).
"Annular unit for moisture management in respiratory mask" was invented by Anna Liu (Shanghai), Linan Zhao (Shanghai) and Kevin Lu (Shanghai).
According to the abstract* released by the U.S. Patent & Trademark Office: "Examples of the present disclosure relate generally to absorbing elements in respiratory face masks. In some examples, a structure for respiratory masks that can both absorb moisture from the face (such as perspiration, as well as from condensed moisture in the breath), and maintain a low breath resistance (won't increase the breath resistance significantly) is disclosed here...