US Patent Issued to HITACHI on March 24 for "Industrial system, abnormality detection system, and abnormality detection method" (Japanese Inventors)

ALEXANDRIA, Va., March 24 -- United States Patent no. 12,585,254, issued on March 24, was assigned to HITACHI LTD. (Tokyo).

"Industrial system, abnormality detection system, and abnormality detection method" was invented by Nobuhiro Kakeno (Tokyo), Yoshiteru Katsumura (Tokyo), Daiki Kajita (Tokyo), Takahiro Nakano (Tokyo) and Miho Arai (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "This industrial system is characterized by being provided with: a storage unit that stores design data used when constructing an industrial line; a simulation execution unit that executes a simulation of movement of the industrial line, based on the design data; and a detection unit that compares a result of the simulation ...