US Patent Issued to Hitachi High-Tech Science on Sept. 8 for "Focused ion beam device" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,731,755, issued on Sept. 8, was assigned to Hitachi High-Tech Science Corp. (Tokyo).

"Focused ion beam device" was invented by Koji Nagahara (Tokyo), Hiroshi Oba (Tokyo) and Yasuhiko Sugiyama (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "An ion beam tube of a composite beam device is provided with an ion source and an ion optics. The ion optics is provided with a diaphragm member in which at least one through-hole that is switchable in order to pass part of an ion beam generated from the ion source therethrough is formed. The ion optics is provided with a blocking member that blocks part of the ion beam passing through the through-hole of the di...