US Patent Issued to HITACHI HIGH-TECH on Sept. 8 for "Method for washing dispensing probe included in automated analyzer, and automated analyzer" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,730,120, issued on Sept. 8, was assigned to HITACHI HIGH-TECH Corp. (Tokyo).

"Method for washing dispensing probe included in automated analyzer, and automated analyzer" was invented by Akihiro Nojima (Tokyo), Yosuke Horie (Tokyo), Masaaki Hirano (Tokyo), Eiichiro Takada (Tokyo), Yuka Miyake (Tokyo) and Takamichi Mori (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "An object of the invention is to provide a technique capable of enhancing a cleaning effect of a dispensing probe while preventing an influence on an analysis throughput. In a method according to the invention, an inner surface of a dispensing probe is cleaned by repeating an inner surf...