US Patent Issued to Hitachi High-Tech on Sept. 15 for "Vacuum processing device and foreign matter ejection method" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 15 -- United States Patent no. 12,734,562, issued on Sept. 15, was assigned to Hitachi High-Tech Corp. (Tokyo).

"Vacuum processing device and foreign matter ejection method" was invented by Taiki Kobayashi (Tokyo), Seiichiro Kanno (Tokyo), Go Miya (Tokyo) and Yuuta Yanbe (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A vacuum processing apparatus includes a computer system, a transport unit configured to transport a sample, a vacuum sample chamber where the sample is processed in a vacuum, and a preliminary exhaust chamber into which the sample is loaded before being transported to the vacuum sample chamber. A partition wall is disposed between the vacuum sample chamber and the ...