US Patent Issued to Hitachi High-Tech on Sept. 15 for "Vacuum processing device" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 15 -- United States Patent no. 12,738,447, issued on Sept. 15, was assigned to Hitachi High-Tech Corp. (Tokyo).

"Vacuum processing device" was invented by Akito Tanokuchi (Tokyo), Hiroki Tsubouchi (Tokyo), Hiroyuki Andou (Tokyo) and Takao Ubukata (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "The purpose of the present disclosure is to provide a vacuum processing device that switches the rate of pressure variation depending on, e.g., the type of an object to be inspected, thereby making it possible to ensure operation reliability during inspection of a fragile object to be inspected, while preventing a decrease in throughput. The vacuum processing device according to the present...