US Patent Issued to Hitachi High-Tech on Oct. 27 for "Charged particle beam inspection system and charged particle beam inspection method" (Japanese Inventors)

ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,776,472, issued on Oct. 27, was assigned to Hitachi High-Tech Corp. (Tokyo).

"Charged particle beam inspection system and charged particle beam inspection method" was invented by Hang Du (Tokyo), Toshiyuki Yokosuka (Tokyo), Yuko Sasaki (Tokyo), Yasuko Watanabe (Tokyo) and Megumi Kimura (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a charged particle beam inspection system that can derive an optimal observation condition using an image prediction model obtained by machine learning of simulation results. The charged particle beam inspection system includes: a charged particle beam irradiation device configured to acquire an image of a ...