ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,785,051, issued on Nov. 3, was assigned to Hitachi High-Tech Corp. (Tokyo).
"Plasma processing apparatus" was invented by Kyohei Horikawa (Tokyo), Takamasa Ichino (Tokyo), Shintarou Nakatani (Tokyo), Kazunori Nakamoto (Tokyo) and Yuki Tanaka (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "An electrostatic chuck 40 has a heater HT1 and a heater HT2 each covered by dielectric films 41 to 45. The heater HT2 is divided into a region HT2a having a circular shape in plan view, a region HT2b surrounding an outer periphery of the region HT2a in plan view, and a region HT2c surrounding an outer periphery of the region HT2a in plan view. The heater HT1 is di...