US Patent Issued to HITACHI HIGH-TECH on Nov. 3 for "Observation system and artifact correction method for same" (Japanese Inventors)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,784,147, issued on Nov. 3, was assigned to HITACHI HIGH-TECH Corp. (Tokyo).

"Observation system and artifact correction method for same" was invented by Mitsutoshi Kobayashi (Tokyo), Atsushi Miyamoto (Tokyo) and Yoshinobu Hoshino (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is technology capable of uniformly reducing artifacts that are in a reconstructed image and that change due to a sampling coordinate group. This observation system comprises an image capture device and a processor subsystem. The processor subsystem sets a sparse sampling coordinate group for a sample, acquires a pixel value group corresponding to the sampling coordin...