US Patent Issued to HITACHI HIGH-TECH on March 31 for "Method for manufacturing diffraction grating and method for manufacturing replica grating" (Japanese Inventors)

ALEXANDRIA, Va., March 31 -- United States Patent no. 12,591,083, issued on March 31, was assigned to HITACHI HIGH-TECH Corp. (Tokyo).

"Method for manufacturing diffraction grating and method for manufacturing replica grating" was invented by Kenta Yaegashi (Tokyo), Yoshisada Ebata (Tokyo) and Takanori Aono (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "This invention relates to a method of manufacturing a diffraction grating 7. First, a wafer 1a having, on a front surface FS1 thereof, a pattern 1b having a shape in which concave portions and convex portions are alternately arranged is prepared. Next, a metal film 3 is formed on the front surface FS1 of the wafer 1a, and a transfer area 3a to which th...