US Patent Issued to Hitachi High-Tech on June 9 for "Charged particle beam device and sample analysis method" (Japanese Inventors)

ALEXANDRIA, Va., June 9 -- United States Patent no. 12,651,723, issued on June 9, was assigned to Hitachi High-Tech Corp. (Tokyo).

"Charged particle beam device and sample analysis method" was invented by Masayoshi Yoshioka (Tokyo), Naoki Sakamoto (Tokyo) and Shinya Kitayama (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A charged particle beam device 1 includes analysis means performed by a controller when a sample holder HL holding a sample SAM is installed on a stage 23. The analysis means includes a step (a) of raising a degree of vacuum of each of an observation chamber 10 and a preprocessing chamber 20 by opening a gate valve VL5, opening a valve VL1, closing a valve VL2, and driving a vacuum pu...