ALEXANDRIA, Va., June 9 -- United States Patent no. 12,651,724, issued on June 9, was assigned to Hitachi High-Tech Corp. (Tokyo).
"Analysis system" was invented by Azusa Konno (Tokyo), Takashi Shidara (Tokyo), Ichiro Fujimura (Tokyo), Daiji Kirihata (Tokyo) and Hiromi Mise (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "Depth information of a multilayer structure is acquired quickly and with high accuracy. An analysis system includes (a) acquiring a first captured image of a sample SAM viewed from a first direction by irradiating the sample SAM including a multilayer structure with an electron beam EB1 from the first direction, (b) acquiring a second captured image of the sample SAM viewed from a seco...