US Patent Issued to Hitachi High-Tech on June 30 for "Ion milling device" (Japanese Inventors)

ALEXANDRIA, Va., July 16 -- United States Patent no. 12,671,056, issued on June 30, was assigned to Hitachi High-Tech Corp. (Tokyo).

"Ion milling device" was invented by Shota Aida (Tokyo), Hisayuki Takasu (Tokyo), Atsushi Kamino (Tokyo) and Hitoshi Kamoshida (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "In order to improve the processing reproducibility, an ion milling device 100 includes a sample chamber 107, a sample stage 102 that is disposed in the sample chamber on which a sample is placed, an ion source 101 that emits an unfocused ion beam toward the sample, a control unit 112 that controls an output of the ion beam, an oscillator 104 that is disposed in the sample chamber, and an oscillation ...