ALEXANDRIA, Va., July 7 -- United States Patent no. 12,674,770, issued on July 7, was assigned to Hitachi High-Tech Corp. (Tokyo).
"Inspection device and inspection method" was invented by Takashi Hiroi (Tokyo), Yuko Otani (Tokyo), Yuya Isomae (Tokyo), Muneyuki Fukuda (Tokyo) and Masakazu Kanezawa (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "The purpose of the present disclosure is to provide a technology which enables, in a step for analyzing a defect of an element, identification of the position of the defect even in a case where the defect is thin or there is an influence of contamination. An inspection apparatus according to the present disclosure irradiates a first region including a defect of ...