US Patent Issued to Hitachi High-Tech on Feb. 24 for "Diagnostic device, semiconductor manufacturing equipment system, semiconductor equipment manufacturing system, and diagnostic method" (Japanese Inventors)

ALEXANDRIA, Va., Feb. 24 -- United States Patent no. 12,564,002, issued on Feb. 24, was assigned to Hitachi High-Tech Corp. (Tokyo).

"Diagnostic device, semiconductor manufacturing equipment system, semiconductor equipment manufacturing system, and diagnostic method" was invented by Satoshi Murasawa (Tokyo), Ryoji Asakura (Tokyo) and Masahiro Sumiya (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "An object of the present disclosure is to provide a diagnostic technique capable of determining an anomaly of an exhaust device or an exhaust pipe of a semiconductor manufacturing apparatus while suppressing variations due to processing conditions. In a diagnostic device for diagnosing a state of a semiconduct...