ALEXANDRIA, Va., Aug. 18 -- United States Patent no. 12,712,149, issued on Aug. 18, was assigned to Hitachi High-Tech Corp. (Tokyo).
"Charged particle beam device and imaging method" was invented by Toshiyuki Yokosuka (Tokyo), Hideyuki Kotsuji (Tokyo) and Hajime Kawano (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "A charged particle beam device for irradiating a sample arranged in a sample chamber to be observed with an electron beam includes: a plasma generation device to which a bias voltage is applicable to generate plasma containing charged particles for applying charges onto a side wall of a pattern of the sample; and a guide that guides the charged particles in the plasma generated by the plasm...