ALEXANDRIA, Va., May 19 -- United States Patent no. 12,631,573, issued on May 19, was assigned to HITACHI HIGH-TECH ANALYSIS Corp. (Tokyo).
"X-ray inspection apparatus and method of inspection with X-rays" was invented by Toshiyuki Takahara (Tokyo), Tsuneo Sato (Tokyo), Satoshi Matsubara (Tokyo), Yuta Seki (Tokyo) and Kazuya Iwata (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "Proposed are an X-ray inspection apparatus and a method of inspection with X-rays in which even in a sample having coated portion and uncoated portion of the cathode material, the inspection of foreign objects in the both portions can be simultaneously performed under the same conditions. The X-ray inspection apparatus includes ...