US Patent Issued to HITACHI ASTEMO on Nov. 3 for "Defect inspection apparatus and defect inspection method" (Japanese Inventors)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,784,184, issued on Nov. 3, was assigned to HITACHI ASTEMO LTD. (Ibaraki, Japan).

"Defect inspection apparatus and defect inspection method" was invented by Yoshihiko Kobayashi (Hitachinaka, Japan), Takateru Seki (Hitachinaka, Japan), Takahiro Fujioka (Hitachinaka, Japan) and Takamasa Imaizumi (Hitachinaka, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention is directed to providing a defect inspection apparatus and a defect inspection method capable of improving determination accuracy of an inspection. A defect inspection method includes causing a defect inspection apparatus to perform an image acquisition step of changing a relati...