US Patent Issued to HERVANNAN SAUNA on May 12 for "Atomic layer deposition apparatus" (Finnish Inventors)

ALEXANDRIA, Va., May 12 -- United States Patent no. 12,624,451, issued on May 12, was assigned to HERVANNAN SAUNA OY (Espoo, Finland).

"Atomic layer deposition apparatus" was invented by Hulda Aminoff (Espoo, Finland), Pekka Soininen (Espoo, Finland), Pekka J. Soininen (Espoo, Finland) and Ville Miikkulainen (Espoo, Finland).

According to the abstract* released by the U.S. Patent & Trademark Office: "An atomic layer deposition apparatus including an atomic layer deposition reactor and a reactor door. The reactor door is arranged against the end edge of the reactor in a closed position of the reactor. The apparatus having a cooling arrangement for cooling the reactor door having a shell structure surrounding the reactor from the outside of...