US Patent Issued to Hefei Visionox Technology on Nov. 3 for "Array substrate, fabrication method of array substrate, and mask" (Chinese Inventors)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,787,433, issued on Nov. 3, was assigned to Hefei Visionox Technology Co. Ltd. (Hefei, China).

"Array substrate, fabrication method of array substrate, and mask" was invented by Yang Li (Hefei, China), Feng Yu (Hefei, China), Bo Li (Hefei, China), Jianqiu Sun (Hefei, China) and Weihua Li (Hefei, China).

According to the abstract* released by the U.S. Patent & Trademark Office: "An array substrate, a fabrication method of the array substrate and a mask, where a metal film is provided on a substrate, a first groove and a second groove are formed on the metal film, the bottom surface of the first groove is closer to the substrate compared to that of the second groove, a projection of the ...