ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,746,484, issued on Sept. 29, was assigned to HANWHA SOLUTIONS Corp. (Seoul, South Korea).
"Method for removing HCL in chlorination reaction" was invented by Jinho Park (Daejeon, South Korea), Namjin Jang (Daejeon, South Korea) and Ji Hye Choi (Daejeon, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention relates to a method for removing HCl in a chlorination reaction, and more particularly, to a method capable of efficiently removing HCl produced during a chlorination reaction of an aromatic compound. The present invention includes, in a chlorination reaction in which a final product with a chlorine-substituted terminal is p...