US Patent Issued to HANSOL CHEMICAL on May 12 for "Organometallic compound, precursor composition comprising same, and method for manufacturing thin film using same" (South Korean Inventors)

ALEXANDRIA, Va., May 12 -- United States Patent no. 12,624,059, issued on May 12, was assigned to HANSOL CHEMICAL Co. LTD. (Seoul, South Korea).

"Organometallic compound, precursor composition comprising same, and method for manufacturing thin film using same" was invented by Hyo-Suk Kim (Jeollabuk-do, South Korea), Min-Sung Park (Daejeon, South Korea), Min-Hyuk Nim (Jeollabuk-do, South Korea), Jang-Hyeon Seok (Sejong-si, South Korea) and Jung-Woo Park (Seoul, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention relates to a vapor deposition compound capable of being deposited as a thin film through vapor deposition and, in particular, to: an organometal-containing compound which ...