US Patent Issued to HANGZHOU SIZONE ELECTRONIC TECHNOLOGY on Sept. 29 for "Polishing pad conditioning apparatus" (Chinese Inventors)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,746,639, issued on Sept. 29, was assigned to HANGZHOU SIZONE ELECTRONIC TECHNOLOGY INC. (Zhejiang, China).

"Polishing pad conditioning apparatus" was invented by Hongxiu He (Zhejiang, China), Yuansi Yang (Zhejiang, China) and Zhipeng Zhou (Zhejiang, China).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed in the present invention is a polishing pad conditioning apparatus, comprising: a connecting arm that horizontally extends; a finishing head unit, provided at one end of the connecting arm and used for finishing a polishing pad; and a base unit, provided at the other end of the connecting arm, movably connected to the connecting arm, and used fo...