US Patent Issued to HAMAMATSU PHOTONICS on Aug. 11 for "Sample support" (Japanese Inventors)

ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,706,289, issued on Aug. 11, was assigned to HAMAMATSU PHOTONICS K.K. (Hamamatsu, Japan).

"Sample support" was invented by Akira Tashiro (Hamamatsu, Japan), Takayuki Ohmura (Hamamatsu, Japan), Masahiro Kotani (Hamamatsu, Japan) and Takamasa Ikeda (Hamamatsu, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A sample support used for sample component ionization includes: a substrate having a first surface and a plurality of holes opening to the first surface; and a conductive layer provided on the first surface so as not to block the hole, in which the conductive layer is configured by a plurality of nanoparticles and has a thickness of 30 nm or more."...