US Patent Issued to HACH LANGE on Sept. 29 for "Photometric process measurement arrangement and a photometric measurement method" (German Inventors)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,747,985, issued on Sept. 29, was assigned to HACH LANGE GMBH (Berlin).

"Photometric process measurement arrangement and a photometric measurement method" was invented by Andre Naggies (Berlin), Axel Leyer (Berlin) and Robert Dalljo (Berlin).

According to the abstract* released by the U.S. Patent & Trademark Office: "A photometric process measurement arrangement (10) comprising a photometric immersion probe (20), the photometric immersion probe (20) comprising a photometer flashlight source (61) for providing photometric light impulses, a photometric detector arrangement (70) comprising at least two separate wavelength-selective detection elements (71, 72, 73), and a photometer contr...