US Patent Issued to Haag-Streit on June 23 for "Ophthalmic workstation" (Swiss Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,661,006, issued on June 23, was assigned to Haag-Streit AG (Koniz, Switzerland).

"Ophthalmic workstation" was invented by Frank Zumkehr (Koniz, Switzerland), Jorg Breitenstein (Koniz, Switzerland), Adrian Zimmermann (Koniz, Switzerland) and Fredy Guarriello (Koniz, Switzerland).

According to the abstract* released by the U.S. Patent & Trademark Office: "The ophthalmic workstation comprises a table having a top surface, a base unit mounted to the table, a microscope, and a headrest. The base unit includes an X-displacement stage, a Z-displacement stage, and a platform mounted to the X-displacement stage and the Z-displacement stage. The microscope is mounted to the platform. The table...