US Patent Issued to GlobalFoundries U.S. on Sept. 1 for "Structures for an electrostatic discharge protection device" (Singaporean, American, German Inventors)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,727,256, issued on Sept. 1, was assigned to GlobalFoundries U.S. Inc. (Malta, N.Y.).

"Structures for an electrostatic discharge protection device" was invented by Sagar Premnath Karalkar (Essex Junction, Vt.), Vishal Ganesan (Dresden, Germany), Kyong Jin Hwang (Singapore) and Souvick Mitra (Essex Junction, Vt.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Structures for an electrostatic discharge protection device and methods of forming same. The structure comprises adjacent first and second gates over a semiconductor substrate, a source adjacent to the first gate, and a drain adjacent to the second gate. The source includes a first well in the semicon...