ALEXANDRIA, Va., June 2 -- United States Patent no. 12,643,831, issued on June 2, was assigned to General Electric Co. (Evendale, Ohio).
"Slurry-based methods for forming a bond coat and articles formed by the methods" was invented by Atanu Saha (Bangalore, India), Satya Kishore Manepalli (Bangalore, India), Nicholas Edward Antolino (Schenectady, N.Y.) and Don Mark Lipkin (Niskayuna, N.Y.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Methods for forming a sintered bond coat (64) on a silicon-based substrate (14) and articles (50) formed by the methods are disclosed. The methods include applying a bond coat slurry on the silicon-based substrate (14), drying the bond coat slurry on the silicon-based substrate...