US Patent Issued to FURUYA METAL on Oct. 27 for "Sputtering target" (Japanese Inventors)

ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,776,481, issued on Oct. 27, was assigned to FURUYA METAL Co. LTD. (Tokyo).

"Sputtering target" was invented by Tomohiro Maruko (Tokyo), Yu Suzuki (Tokyo), Shohei Otomo (Tokyo) and Hironobu Nakamura (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A sputtering target including aluminum and either a rare earth element or a titanium group element or both a rare earth element and a titanium group element, and the sputtering target has a fluorine content of 100 ppm or less."

The patent was filed on June 26, 2020, under Application No. 17/623,943.

*For further information, including images, charts and tables, please visit: http://patft.uspto.gov/netacg...