ALEXANDRIA, Va., July 21 -- United States Patent no. 12,687,659, issued on July 21, was assigned to FUKUVI CHEMICAL INDUSTRY Co. LTD. (Fukui, Japan).
"Antireflection substrate" was invented by Teppei Itamoto (Fukui, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "An antireflection substrate includes a resin substrate, and an underlying layer, a hard coat layer, an antireflection layer, and a cover layer which are provided on the resin substrate in this order. The underlying layer is formed of a cured material of a hexafunctional or higher functional urethane (meth)acrylate compound (A1), the hard coat layer contains a cured material of a urethane (meth)acrylate compound (A) containing a trifunctional or...