US Patent Issued to FUJIMI on March 17 for "Polishing composition containing zirconia particles and an oxidizer" (Japanese Inventor)

ALEXANDRIA, Va., March 17 -- United States Patent no. 12,577,430, issued on March 17, was assigned to FUJIMI Inc. (Kiyosu, Japan).

"Polishing composition containing zirconia particles and an oxidizer" was invented by Jie Lin (Kiyosu, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided herein are CMP compositions, and methods for polishing surfaces comprising amorphous carbon, spin-on carbon (SoC), and/or diamond like carbon (DLC) films. The CMP compositions of the present disclosure contain at least one abrasive having zirconia particles and may also contain at least one metal-containing oxidizer."

The patent was filed on Feb. 25, 2021, under Application No. 17/802,773.

*For further information, ...