ALEXANDRIA, Va., March 17 -- United States Patent no. 12,578,648, issued on March 17, was assigned to FUJIFILM Corp. (Tokyo).
"Rinsing liquid and pattern forming method" was invented by Satomi Takahashi (Shizuoka, Japan) and Toru Tsuchihashi (Shizuoka, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "An object of the present invention is to provide a rinsing liquid that has excellent resolution and excellent film thickness loss suppressiveness in a case where the rinsing liquid is used to rinse a resist film and a pattern forming method that uses the rinsing liquid. The rinsing liquid according to an embodiment of the present invention is a rinsing liquid for resist film patterning for a resist film obta...