ALEXANDRIA, Va., July 7 -- United States Patent no. 12,677,618, issued on July 7, was assigned to FUJIFILM Corp. (Tokyo).
"Composition and method for treating substrate" was invented by Moe Narita (Shizuoka, Japan) and Nobuaki Sugimura (Shizuoka, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention provides a composition having an excellent dissolving ability for a transition metal-containing substance and a method for treating a substrate. The composition according to an embodiment of the present invention contains at least one oxohalogen acid compound selected from the group consisting of hypochlorous acid, chlorous acid, chloric acid, bromic acid, and salts thereof and a compound rep...