ALEXANDRIA, Va., Feb. 17 -- United States Patent no. 12,554,201, issued on Feb. 17, was assigned to FUJIFILM Corp. (Tokyo).
"Liquid chemical and method for producing liquid chemical" was invented by Tetsuya Kamimura (Shizuoka, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "An object of the present invention is to provide a liquid chemical exhibiting excellent defect inhibitive performance even in a case of being applied to a resist process by EUV exposure. Another object thereof is to provide a method for producing a liquid chemical. The liquid chemical of the present invention includes an organic solvent; Fe nanoparticles containing a Fe atom and having a particle size of 0.5 to 17 nm; and Pb nanopart...