US Patent Issued to FUJIFILM on Aug. 11 for "Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and compound" (Japanese Inventors)

ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,704,782, issued on Aug. 11, was assigned to FUJIFILM Corp. (Tokyo).

"Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and compound" was invented by Minoru Uemura (Haibara-gun, Japan), Takeshi Kawabata (Haibara-gun, Japan), Toshiaki Fukuhara (Haibara-gun, Japan), Akinori Shibuya (Haibara-gun, Japan) and Kei Yamamoto (Haibara-gun, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An actinic ray-sensitive or radiation-sensitive resin composition contains a compound represented by General Formula (I). In General Formula (I...