ALEXANDRIA, Va., July 14 -- United States Patent no. 12,681,380, issued on July 14, was assigned to Fujian Jinhua Integrated Circuit Co. Ltd. (Quanzhou City, China).
"Layout and photomask" was invented by Weiwei Wu (Quanzhou City, China) and Hsiang-Yu Hsieh (Quanzhou City, China).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure provides a photomask and a method of forming a photomask, in which the photomask may obtain an optimized uniformity via a simplified process flow. The photomask includes a plurality of stair-like patterns parallel disposed with each other, wherein each of the stair-like patterns includes a plurality of first right angles at one side and a plurality of second right ...