ALEXANDRIA, Va., July 14 -- United States Patent no. 12,684,794, issued on July 14, was assigned to FUJI ELECTRIC Co. LTD. (Kanagawa, Japan).
"Semiconductor apparatus, and manufacturing method thereof" was invented by Hidenori Tsuji (Higashimurayama-city, Japan), Katsunori Ueno (Matsumoto-city, Japan), Shinya Takashima (Hachioji-city, Japan) and Takashi Yoshimura (Matsumoto-city, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A manufacturing method of a semiconductor apparatus including: setting, depending on a distribution of the carrier concentrations that the buffer region should have, a dose amount of hydrogen ions to be implanted into a plurality of depth positions corresponding to the plurality o...