ALEXANDRIA, Va., March 3 -- United States Patent no. 12,565,714, issued on March 3, was assigned to FLOSFIA INC. (Kyoto, Japan).
"Film formation method" was invented by Makoto Shimizu (Tokyo), Hiroshi Shiho (Tokyo), Hiroyuki Ando (Kyoto, Japan), Naoyuki Tsukamoto (Kyoto, Japan) and Yuji Kato (Kyoto, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A film formation method having an excellent mass productivity, whereby a time required for forming a film having a desired thickness is short. In the film formation method, at least one of a metal complex having two or more different ligands, and a metal complex having same ligands and substituents is used, and the method includes atomizing or dropletizing a li...